CONSTRUCTION AND OPTIMIZATION OF THE REACTOR FOR RAPID THERMAL PROCESSING OF LARGE DIAMETER WAFERS
Author: Oleg A. Agueev Company: Taganrog State University Date Published: 2/13/2001
Pan Pacific Symposium
Abstract: The rapid thermal processing (RTP) by a non-coherent radiation is one of the most perspective heat methods under production of ULSIC. The magnification of wafers diameter used in microelectronic technology has led to amplification of interest to a reactor construction optimization problem for RTP apparatus. In the present work with the help of mathematical modeling methods the general regularities of reactor geometry influence for RTP on silicon wafers exposure with 200 mm diameter are considered. The recommendations for increase the distribution of light stream uniformity on a surface of the wafer are represented. The optimization of reactionary camera construction is achieved.
Keywords: rapid thermal processing, big diameter wafers, modeling, reactor construction optimization.