Technology Alternatives Towards Low-Cost and High-Speed Interconnect ManufacturingAuthors: F. Roozebooma, B. Kniknie, A.M. Lankhorst, G. Winands, R. Knaapen, P. Poodt, G. Dingemans, W. Keuning, W.M.M. Kessels, J.E. Bullema, P.M.M.C. Bressers, G. Oosterhuis, M. Mueller and A.J. Huis in't Veld
Company: TNO, Eindhoven University of Technology, Advanced Laser Separation International, and University of Twente
Date Published: 2/14/2012 Conference: Pan Pacific Symposium
TSV, Spatially-divided Deep Reactive Ion Etching, ALD Oxide Passivation, Electrochemical Micro-machining, Laser-Induced Forward Transfer
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