SMTA International Conference Proceedings


Author: S. Cruchon-Dupeyrat
Company: NanoInk, Inc.
Date Published: 9/21/2003   Conference: SMTA International

Abstract: The Dip Pen NanolithographyTM (DPNTM) process is a novel patterning technique, in which the sharp tip of a microfabricated cantilever delivers chemical reagents (inks) by contacting a target substrate. This method, similar to using a micrometric quill pen, is capable of fabricating nanometer-scale patterns down to ~10 nm. It can deposit a wide variety of inks, from metal precursors to nanoparticles to biomolecules, while under ambient conditions.

In the following, we discuss (1) the DPN process; DPN-enabling technologies, including (2) arrays of (individually actuated) cantilevers for parallel, high-throughput lithography and (3) microfluidics for multiple ink delivery. The DPNWriteTM software, a computer-aided design and instrument control platform capable of fabricating and aligning nanopatterns, and the newest NSCRIPTORTM DPNWriterTM instrument is also briefly overviewed.

Key words: high-throughput nanolithography, MEMS cantilever array, microfluidics, nanoElectronics.

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