ELECTRODEPOSITED RESIST - A COMPARISON BETWEEN POSITIVE AND NEGATIVE RESISTAuthors: Daniel Paine, Ph.D. et al.
Company: Semitool, Inc.
Date Published: 12/3/2002 Conference: NEPCON West - Fiberoptic Expo
A comparison between positive and negative ED resist yielded differences in thickness ranges, resolution, surface roughness, baking effects, develop chemistries, and response to voltage changes. Similarities included exposure wavelength sensitivity and strip chemistries. A thorough understanding of these characteristics is necessary to determine which version of ED resist can be used to streamline subsequent processes and reduce costs.
Key words: electrodeposited resist, conformal, three-dimensional, MEMS.
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